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The solid solubility and diffusion coefficients of boron in silicon have been determined as a function of temperature over the range of 700°–1151°C, by anodically sectioning diffused layers. The solid solubility was found to vary from at 700°C to at 1151°C. The diffusion coefficients for impurity levels below 10 18 atoms/cm 3 may be represented by . The diffusion coefficients above 10 18 atoms/cm 3 were found to be dependent on the impurity level.
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Vick et al. (1969) studied this question.
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