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November 1, 2003Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff

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ZYZhaoning YuCalifornia Institute of TechnologyHGHe GaoYanbian UniversityWWWei WuUniversity of Southern California

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Yu et al. (2003) studied this question.

synapsesocial.com/papers/6a753e9601b447f0dadc0c8bhttps://doi.org/10.1116/1.1619958
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  5. 5Reflection properties of nanostructure-arrayed silicon surfaces2000 · 211 citations