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November 1, 1996Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Large-area achromatic interferometric lithography for 100 nm period gratings and grids

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Authors

TST. A. SavasHarvard UniversityMSMark L. SchattenburgMassachusetts Institute of TechnologyJCJ. M. CarterMassachusetts Institute of Technology

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Savas et al. (1996) studied this question.

synapsesocial.com/papers/6a7593b321c246c84a67a4b2https://doi.org/10.1116/1.588613
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