Fabrication of Microchannels in Synthetic Polycrystalline Diamond Thin Films for Heat Sinking Applications

A novel process for the formation of microchannels in polycrystalline diamond thin film on a single‐crystal silicon substrate is developed using anisotropic chemical etching of silicon and selective deposition of diamond. The polycrystalline diamond thin films were grown by high‐pressure microwave plasma assisted chemical vapor deposition using a gas mixture of methane and hydrogen gases. Fabrication procedure, scanning electron microscopy views of surface morphology, cross‐sectional features of microchannels in polycrystalline diamond thin films, and potential applications of microchannels are reported.