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April 1, 2017Proceedings of Universities ELECTRONICSOpen Access

Dependence of Mechanical Stress in Silicon Nitride Films on Conditions of Plasma-Enhanced Chemical Vapor Deposition

A. V. Novak V. R. Novak Anna A. Dedkova E. E. Gusev

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SiN x , SiH 4 NH 3 , , - . . SiN x , , : , , ,

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Novak et al. (2017) studied this question.

synapsesocial.com/papers/6a75d3e40cb096e2ae19cd32 https://doi.org/10.24151/1561-5405-2017-22-2-138-146

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