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October 16, 1971physica status solidi (a)

Low-temperature migration of silicon through metal films importance of silicon-;metal interface

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Authors

AHAkio HirakiOkayama Saiseikai General HospitalELE. LugujjoCalifornia Institute of TechnologyMNM‐A. NicoletCalifornia Institute of Technology

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Hiraki et al. (1971) studied this question.

synapsesocial.com/papers/6a75dd8ff56d87d9178b6e44https://doi.org/10.1002/pssa.2210070212
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