The thermal reaction of Ti with Si3N4 was studied over the temperature range from 500 to 800 °C with Auger electron spectroscopy, Rutherford backscattering spectrometry, and transmission electron microscopy. The initial reaction consumes part of the silicon nitride and yields a two-layer morphology of Ti(N) on top of Ti5Si3. As the reaction proceeds, the Ti5Si3 layer is converted to TiSi2. At 800 °C, a multilayer morphology is observed containing primarily TiN and TiSi2.
No takes yet. Share an insight, caveat, or question.
Barbour et al. (1987) studied this question.
Synapse has enriched 4 closely related papers on similar clinical questions. Consider them for comparative context: