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August 9, 2026Open Access

Thin Film Deposition Technology and Electrochromism: A Review of Techniques, Materials, and Applications

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Authors

SKShital Baburao KhotSWShailaja S. WadkarASAvdhut Shivaji Sutar

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Overview

Review reveals the influence of deposition techniques on electrochromic performance in devices, indicating optimization strategies.

Key Points

  • This review aims to analyze various thin film deposition techniques and their impact on electrochromism in materials, particularly tungsten trioxide.
  • Reviewed deposition techniques including physical vapor deposition, chemical vapor deposition, and wet-chemical methods.
  • Evaluated the performance of electrochromic materials through figures of merit and comparative analyses.
  • Discussed applications in smart windows and other technologies, supported by simulated graphs and tables.
  • Identified optimal deposition parameters crucial for enhancing electrochromic responses.
  • Highlighted tungsten trioxide as a key material with specific metrics like coloration efficiency and switching time.
  • Proposed exploration of flexible and hybrid organic-inorganic materials for future development.

Cite This Study

Khot et al. (2026) studied this question.

synapsesocial.com/papers/6a782d5f2e1896536c8405aahttps://doi.org/10.5281/zenodo.21839297
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