We propose an inexpensive novel rapid prototyping approach to a maskless and fully adaptive photolithographic process. Phase-only computer-generated holograms of lithographic masks displayed on a liquid-crystal-on-silicon spatial light modulator were used in a holographic optical lithography system. Using holographic projection allows diffraction-limited performance within the given parameters of the optical system, adaptive software refocusing, and a continuous, pixel-free pattern. With the demonstrator, we have successfully proven the concept for micrometer-size lithographic features.
No takes yet. Share an insight, caveat, or question.
Bay et al. (2010) studied this question.
Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context: