A versatile new method for generating magnetic nanostructures with dimensions ranging from several hundred nanometers to sub-100 nm is presented here. The method is based on dip-pen nanolithography and allows precise feature size control by tuning the tip–substrate contact time and the scan speed. The Figure shows an AFM topography image of an array of iron oxide nanodots on a gold substrate.
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Liu et al. (2002) studied this question.
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