The isothermal oxidation behavior of commercial hot‐pressed Si 3 N 4 was evaluated for temperatures from 1300° to 1500°C. Multiphase scales were formed, consisting mainly of α‐cristobalite and enstatite. A large increase in reaction rate above 1450°C is believed to be caused by melting in the scale and the consequent increase in the rate of oxygen transport. No oxygen pressure dependence was observed at 1400°C over the oxygen pressure range 10 ‐9 atm to 600 torr. However, a small decrease in the kinetics was observed when measurements were made in reduced total pressures of oxygen as compared to O 2 /N 2 mixtures at a constant total pressure.
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TRIPP et al. (1976) studied this question.
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