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A diblock copolymer, i.e., poly(isobutyl vinyl ether)‐ b ‐poly[2‐(vinyloxy)ethyl cinnamate] (PIBVE‐ b ‐PVEC), has been shown to form polymer brushes quickly on the surface of solid substrates by deposition from a solvent selectively poor for PVEC. The resultant brush could be cross‐linked photochemically by initiating the dimerization between VEC groups of different polymer chains and the cross‐linking was extremely efficient. Crosslinked polymer brushes, as expected, were resistant to organic solvent, such as chloroform, and nitric acid attacks. Important industrial applications are expected of cross‐linked brushes.
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Liu et al. (1994) studied this question.
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