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By the interaction of p-(2-carboxy)cyclopropyl styrene with butyllithium solution in pentane, a new keto-substituted monomer 2-butanoncyclopropyl styrene has been synthesized and its structure has been determined using IR and NMR spectra. The radical homopolymerization of the obtained monomer in the presence of AIBN in a benzene solution has been carried out. Unlike the IR spectrum of the monomer, in the IR spectrum of the homopolymer, the intensive bands characteristic for the vinyl group are absent, since the homopolymerization proceeds with the opening of the vinyl group. The formal kinetics of the radical polymerization of the synthesized monomer has been studied and the kinetic equation of polymerization of W = k[AIBN]0.5[para-(BCS)], and also the activation energy value (71.8 kJ/mol) has been found. The synthesized homopolymer has photosensitive groups. The cyclopropane and carbonyl groups are cross-linked under UV irradiation. The photosensitivity of the homopolymer is Ψ = 55.5 cm2/C. Poly-(2-butanone)cyclopropyl styrene has prospects for use as a negative photoresist in microelectronics and lithography.
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Mamedli et al. (2026) studied this question.
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