Computational modeling reveals localized electron heating in magnetized argon plasmas, indicating enhanced control over electron energy distributions for materials processing.
Optimizing and controlling electron energy distributions (EEDs) is a continuing goal in plasma materials processing as EEDs determine the rate coefficients for electron impact processes. There are many strategies to customize EEDs in low pressure inductively coupled plasmas (ICPs), for example, pulsing and choice of frequency, to produce the desired plasma properties. Recent experiments have shown that EEDs in low pressure ICPs can be manipulated through the use of static magnetic fields of sufficient magnitudes to magnetize the electrons and confine them to the electromagnetic skin depth. The EED is then a function of the local magnetic field as opposed to having non-local properties in the absence of the magnetic field. In this paper, EEDs in a magnetized inductively coupled plasma (mICP) sustained in Ar are discussed with results from a two-dimensional plasma hydrodynamics model. Results are compared with experimental measurements. We found that the character of the EED transitions from non-local to local with application of the static magnetic field. The reduction in cross-field mobility increases local electron heating in the skin depth and decreases the transport of these hot electrons to larger radii. The tail of the EED is therefore enhanced in the skin depth and depressed at large radii. Plasmas densities are non-monotonic with increasing pressure with the external magnetic field due to transitions between local and non-local kinetics.
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Song et al. (2014) studied this question.
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