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Hf distributions in as-grown and annealed (HfO₂)0.25(SiO₂)0.75 films with thicknesses in the range of 4--19 nm were investigated by high-resolution transmission electron microscopy, high angle annular dark field scanning transmission electron microscopy and angle-resolved x-ray photoelectron spectroscopy. Composition waves normal to the film surface were observed providing evidence for surface-directed spinodal decomposition in the pseudobinary (HfO₂)ₓ(SiO₂)_1-x alloy system.
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Liu et al. (2009) studied this question.
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