Deposition of Organic Coatings at Atmospheric Pressure from Liquid Precursors

This paper reports on the deposition of organic coatings on flat substrates using atmospheric pressure plasma systems. Special attention will be paid on the use of liquid monomer as the precursor, injected directly into the plasma region, or in post‐discharge. We will also present an original technology that combines a dielectric barrier discharge and an electrohydro dynamic atomisation (EHDA) system to deposit well‐defined polyacrylic acid films. The advantage of such system is the possibility to limit the extent of the monomer fragmentation and to give rise to rapid deposition of a highly functionalised plasma polymer layer. magnified image