With ever shrinking dimensions in microelectronics, the conductivity performance of charge carriers approaches physical limits and demands tighter control. We show that near-field microscopy carried out at sufficiently long infrared wavelengths—below the plasma frequency—selectively detects and characterizes subsurface mobile carriers with 30 nm resolution, timely for next generation chips as well as for fundamental research, e.g., on low-dimensional electron systems.
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Knoll et al. (2000) studied this question.
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