Device fabrication and transport measurements of FinFETs built with²⁸Si SOI wafers toward donor qubits in silicon

We report on the fabrication of transistors in a FinFET geometry using isotopically purified silicon-28-on-insulator (28-SOI) substrates. Donor electron spin coherence in natural silicon is limited by spectral diffusion due to the residual 29 Si nuclear spin bath, making isotopically enriched nuclear spin-free 28 Si substrates a promising candidate for forming spin quantum bit devices. The FinFET architecture is fully compatible with single-ion implant detection for donor-based qubits and the donor spin-state readout through electrical detection of spin resonance. We describe device processing steps and discuss results on electrical transport measurements at 0.3 K.