Characteristics of a direct metal ion beam deposition source

In this study, we examine the performance of a direct metal ion beam deposition (DMIBD) system which uses a Cs–mordenite pellet as the ion source. We describe design aspects of DMIBD and process parameters such as secondary ion yields, secondary ion energy distributions, secondary ion to atom arrival ratios and deposition rates for C, Al, Si, Ni, Cu, Ta, and W targets. During deposition, the secondary negative metal ion yield strongly depends on the primary Cs+ ion does and bombarding energy. Also, the deposition rate and ion to atom arrival ratios for various targets can be controlled by adjusting the primary Cs+ ion dose, Cs+ ion bombarding energy, and ion beam energy to fit the desired application.