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The differences between two widely used intermediate-level charge transport models are investigated. The origins of the models are reviewed, and mathematical relationships between the models are established. The practical consequences of the differences are investigated by comparing results obtained for several submicron structures. The predictions of the two models are shown to differ qualitatively, as well as quantitatively, for certain situations. An appendix summarizes the numerical techniques used to implement the models in a device simulator.>
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Apanovich et al. (1994) studied this question.
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