An experimental comparison of rotational temperatures determined from optical emission spectroscopy (OES) of with the gas kinetic temperature is reported. A positive column discharge in a high-temperature oven is used. The oven temperature, determined with a thermocouple, provides a lower bound for the gas kinetic temperature. A thermal conduction calculation using the total power input to the discharge provides an upper bound for the gas kinetic temperature. A range of gas temperatures and pressures is explored. Two bands of molecular hydrogen were examined: the R branch of the G (0,0) band and the R branch of the (0,0) Fulcher band. Measurements of the rotational temperature using emission from the band fall within the gas kinetic temperature bounds for temperatures above . Data from the Fulcher band do not show a correlation with the gas temperature and give a constant rotational temperature independent of oven temperature.
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Goyette et al. (1996) studied this question.
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