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A systematic surface kinetic study of ion-induced chemical vapor deposition (II-CVD) of Cu from Cu(I) hexafluoroacetylacetonate vinyltrimethylsilane was performed using quartz crystal microbalance mass deposition rate measurements, x-ray photoelectron spectroscopy compositional analysis, and laser-induced thermal desorption coverage measurements in a multibeam scattering apparatus. With the above, a phenomenological surface kinetic model describing the adsorption, deposition (both of the desired source metal and of unwanted impurities), byproduct desorption, and sputtering processes involved in II-CVD was formulated. The surface kinetic model predicts the deposition rate, composition, and precursor coverage dependencies in agreement with experimental results.
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Chiang et al. (1997) studied this question.
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