We demonstrate that resist kinoforms can be used for laser micromachining. A 10-level resist kinoform, manufactured by electron-beam lithography, was shown to have a diffraction efficiency of 68%. Nine diffraction-limited holes were simultaneously drilled in 0.10-mm-thick stainless steel. Marking in a silicon wafer is also demonstrated.
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Ekberg et al. (1991) studied this question.
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