Answers are grounded in this paper and cite their sources.
A microbeam plasma was successfully generated by using an originally designed capacitively coupled rf plasma reactor which was composed of a needle cathode (1 mm φ), a cylindrical anode (3 mm φ), and a quartz tubing inserted between the cathode and anode. When the reactor was operated in open air and helium was steadily fed as a discharge gas, a plasma beam (φ<2 mm) blew out into air. Conditions for generating a stable plasma were investigated. Preliminary results are presented on the etching of Si by this beam plasma, as well as an emission analysis of the etching plasma.
No takes yet. Share an insight, caveat, or question.
Koinuma et al. (1992) studied this question.
Synapse has enriched 10 related papers. Consider them for comparative context: