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June 1, 2004Journal of the American Chemical Society

An Ultraviolet-Curable Mold for Sub-100-nm Lithography

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Authors

PYPil J. YooInstitute of NanotechnologySBSeung Jae BaekNational Cancer CenterTKTae Wu KimKorea Advanced Institute of Science and Technology

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Yoo et al. (2004) studied this question.

synapsesocial.com/papers/6a7f651e951d4ff56dc0e540https://doi.org/10.1021/ja048972k
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