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January 1, 1969Journal of The Electrochemical Society

Characteristics of Fast Surface States Associated with SiOsub 2-Si and Sisub 3Nsub 4-SiOsub 2-Si Structures

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Authors

BDB. E. DealStanford UniversityEME. L. MacKennaFairchild Semiconductor (United States)PCP. L. CastroFairchild Semiconductor (United States)

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Deal et al. (1969) studied this question.

synapsesocial.com/papers/6a81965ed433ecbb06e1d70ehttps://doi.org/10.1149/1.2412205
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