Nanometer fabrication has been investigated with Langmuir-Blodgett (LB) films made of a chemical amplification resist SAL601 (Shipley Co.). It is found that uniform SAL601 LB films are formed by a conventional method, in which the surface pressure is reduced during film transfer. Finely focused electron beams are used for fabrication. Ultra small edge roughness in the delineated resist patterns (nano edge roughness) is suppressed by using LB technique compared to spin-coating, but sensitivity of the LB film is lowered. Suppression of the nano edge roughness in LB films is thought to be due to an ordered structure, which is indicated by Fourier transform infrared spectroscopy measurements.
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Yoshimura et al. (1994) studied this question.
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