Neat styles of writing: Recent reports on massively parallel dip-pen nanolithography and further improvements in the resolution of microcontact printing signify that patterning self-assembled monolayers on the submicrometer scale over large areas has now reached a level of sophistication that allows it to rival “hard” lithographic techniques, while retaining the flexibility of using the patterned substrates as a platform for further chemical modification.
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Wilhelm T. S. Huck (2007) studied this question.
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