Important steps in metal‐mediated stoichiometric or catalytic reactions of organosilicon compounds are oxidative additions and reductive eliminations. Although the tools to tune the ability of a metal complex fragment to undergo such reactions are, in principle, known—for example, oxidative additions are facilitated by metals which are easily oxidized and by small ancillary ligands—the challenge for the chemist is to make these reactions, particularly for SiC and SiSi bonds, more predictable.
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Ulrich Schubert (1994) studied this question.
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