Enhanced High-Temperature Electronic Transport Properties in Nanostructured Epitaxial Thin Films of the Lan₊₁NinO₃n₊₁ Ruddlesden−Popper Series (n = 1, 2, 3, ∞)

Epitaxial thin films of lanthanum nickel oxide Ruddlesden−Popper series (La n +1 Ni n O 3 n +1 ) have been prepared on different single-crystal substrates by metal organic chemical vapor deposition. Varying the La/Ni composition ratio in the precursor solution allows deposition of films with controlled La/Ni stoichiometry ranging between 1 and 2. Epitaxial La 2 NiO 4 ( n = 1) and LaNiO 3 ( n = ∞) pure phases were obtained for La/Ni close to 2 and 1, respectively. For intermediate La/Ni composition, films with a microstructure consisting of a disordered stacking of nanodomains with progressively increasing average n value were obtained. Similarly with bulk samples, the electronic conductivity of the nanostructured films increases with the measured average n value, opening the possibility to prepare new mixed ionic and electronic conducting nanocomposite thin films with tailored properties