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Submicron NbN/MgO/NbN Josephson tunnel junctions for Josephson integrated circuits were investigated. The junctions have been fabricated by the cross-line patterning (CLIP) method with an electron-beam (EB) direct-writing technique. The all-refractory fabrication process for logic circuits using the CLIP method is presented. This process is applied to the fabrication of a logic gate of 4JL containing 0.8- mu m-square junctions as an example of digital application. A logic gate has been fabricated by this process, and its characteristics are discussed.>
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Aoyagi et al. (1989) studied this question.
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