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July 1, 1995Journal of The Electrochemical SocietyOpen Access

Suppression of Arsenic Autodoping with Rapid Thermal Epitaxy for Low Power Bipolar Complementary Metal Oxide Semiconductor

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Authors

CKC. A. KingJiangsu UniversityWJWayne JohnsonUniversity of UtahTCT.-Y. ChiuTaiwan Semiconductor Manufacturing Company (China)

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Cite This Study

King et al. (1995) studied this question.

synapsesocial.com/papers/6a82be9c23a6926b671e15cehttps://doi.org/10.1149/1.2044315
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