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January 1, 1993IEEE Transactions on Semiconductor ManufacturingOpen Access

Independent control of ion density and ion bombardment energy in a dual RF excitation plasma

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HGH. GotôNTT Basic Research LaboratoriesHLHans-Dirk LöweTohoku UniversityTOT. OhmiTohoku University

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Gotô et al. (1993) studied this question.

synapsesocial.com/papers/6a82fb1ef2457b8164efdce2https://doi.org/10.1109/66.210658
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