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January 1, 1994Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Two-dimensional modeling of high plasma density inductively coupled sources for materials processing

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Authors

PVPeter L. G. VentzekRHRobert J. HoekstraMKMark J. Kushner

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Ventzek et al. (1994) studied this question.

synapsesocial.com/papers/6a82fb2df2457b8164efdcfbhttps://doi.org/10.1116/1.587101
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