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January 1, 1993Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Effects of ion bombardment in plasma etching on the fluorinated silicon surface layer: Real-time and postplasma surface studies

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GOG. S. OehrleinUniversity of Maryland, College Park

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G. S. Oehrlein (1993) studied this question.

synapsesocial.com/papers/6a8317baef922d238058297e https://doi.org/10.1116/1.578717

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