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July 3, 1995Applied Physics Letters

SiO2 deposition from oxygen/silane pulsed helicon diffusion plasmas

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Authors

CCChristine CharlesUniversité Claude Bernard Lyon 1RBR. W. BoswellAustralian National UniversityHKHajime KuwaharaAustralian National University

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Cite This Study

Charles et al. (1995) studied this question.

synapsesocial.com/papers/6a8351e3b95cf4e61630e3d2https://doi.org/10.1063/1.115485
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