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Experiments were performed to explore the correlation (or lack thereof) between the surface effect and plasma characteristics of discharges in and . The optical emission from excited fluorine can be greatly enhanced by the dilution of these gases with helium, yet the etch rate of Si (or ) is decreased by this dilution. The effect of biasing the sample with respect to the plasma potential was investigated, and for , evidence was found for a reaction involving a negative ion.
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Ianno et al. (1981) studied this question.
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