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The ionization probability of an atomic particle sputtered from a simple substrate system has been analyzed with use of a computer simulation of the sputtering process. The ionization probability was found to have a Boltzmann-like functional form and a quantity called "the effective temperature" Tₑ could be defined. The value of Tₑ was found to be in the range of 2000-3500 K. The dependence of Tₑ on the microscopic parameters of the system has been investigated.
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S̆roubek et al. (1980) studied this question.
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