RF Selfbias Voltage and Sheath Width in Inductively Coupled Chlorine Plasma

Radio frequency (RF) self-bias was systematically measured in an inductively coupled Cl 2 plasma and it was compared with the theory previously reported for the negative ion containing plasma. Measured RF self-bias was easier to build up at lower RF source power, and this is simply because the negative chlorine ion relatively increases and thus the sheath width becomes larger in this condition. The experimentally determined sheath width was found to be consistent with the theory.