Synapse
⌘+K
Synapse
PulseExploreClubsResearchersJournals
Instagram
HomeClubsExplore
December 1, 1985Journal of Applied Physics

Distribution of ion energies incident on electrodes in capacitively coupled rf discharges

View Full Paper
Ask AI
Bookmark
Share

Authors

MKMark J. KushnerUniversity of Michigan

Discussion

Loading...

Member takes

Overview

Key Points

Key points are not available for this paper at this time.

Cite This Study

Mark J. Kushner (1985) studied this question.

synapsesocial.com/papers/6a8420cdc967ec513cbd89aehttps://doi.org/10.1063/1.335580
View Full Paper
Ask AI
Bookmark
Share

Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Bias effects on the deposition of hydrogenated amorphous silicon film in a glow discharge1984 · 23 citations
  2. 2Sensitive, Nonintrusive,<i>In-Situ</i>Measurement of Temporally and Spatially Resolved Plasma Electric Fields1984 · 148 citations
  3. 3Basic chemistry and mechanisms of plasma etching1983 · 167 citations
  4. 4Energy Anomalies Observed in Ion Beams Produced by rf Sources1962 · 31 citations
  5. 5Relation between the RF discharge parameters and plasma etch rates, selectivity, and anisotropy1984 · 61 citations