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A study was made of the properties of chromium films formed by vacuum deposition techniques. It was found possible to obtain films that had nearly bulk characteristics by using specific deposition conditions. The resistivity was determined as a function of film thickness. The orientation of the films was determined using x-ray diffraction. The film orientation was found to be dependent upon the particular glassy material used as a substrate. The resistance anomaly associated with the antiferromagnetic-paramagnetic transition in bulk chromium was observed. The experimentally determined resistance-temperature relationships for the Cr films were explained in terms of the effects of stress on the magnetic transition temperature.
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Milgram et al. (1968) studied this question.
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