We propose the fabrication at submicron resolution of a patterned thin film of tris(8-hydroxyquinolinato)aluminum(III) (AlQ 3 ) on a SiO/Si surface by modified microtransfer molding. The film is formed during the printing process. In this manner, it is possible to obtain a patterned homogeneous film with nanometer-size features by a single step, with no change to its adhesion and mechanical properties.
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Cavallini et al. (2001) studied this question.
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