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Characterization of silicon nitride thin films deposited by reactive sputtering and plasma-enhanced CVD at low temperatures, Takeyama, Mayumi B., Sato, Masaru, Nakata, Yoshihiro, Kobayashi, Yasushi, Nakamura, Tomoji, Noya, Atsushi
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Takeyama et al. (2014) studied this question.
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