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A new method for making p-n junctions based on immersion in a transparent dopant gas followed by irradiation with a pulsed laser is presented. An alexandrite laser was used, operating at 0.73 μm where photolysis of the dopant gas PH3 does not occur. Multiple pulses of 2.2–2.7 J/cm2 were used to make Si solar cells with total area efficiencies up to 8.6% without benefit of antireflection coatings.
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Turner et al. (1981) studied this question.
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