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The present review intends to help its reader find a suitable method for temperature measurement in Millisecond Spike Annealing (MSA). For this purpose it is going to highlight current and former industrial and research approaches for both RTP (Rapid Thermal Processing) and MSA to measure the “true wafer temperature.” The theoretical background of each measurement technique is considered along with its capability to be applied in MSA tools as well as its suitability for industry in terms of time and temperature resolution.
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Reichel et al. (2011) studied this question.
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