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April 1, 1984Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

MO/Ti bilayer metallization for a self-aligned TiSi2 process

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Authors

HPH. K. ParkTektronix (United States)JSJ. SachitanoTektronix (United States)GEGregory C. EidenRichland College

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Park et al. (1984) studied this question.

synapsesocial.com/papers/6a859fbdd5d2dbb293d4c425https://doi.org/10.1116/1.572575
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