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May 1, 1978IBM Journal of Research and Development

X-Ray Photoelectron Spectroscopy of SiO 2 -Si Interfacial Regions: Ultrathin Oxide Films

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SRS. I. RaiderIBM Research - Thomas J. Watson Research CenterRFR. FlitschIBM (United States)

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Cite This Study

Raider et al. (1978) studied this question.

synapsesocial.com/papers/6a85c09d37bcb8373dadbabahttps://doi.org/10.1147/rd.223.0294
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