Production of High‐Density Capacitively Coupled Plasma with RF Multi‐Hollow Cathode and/or High Secondary Electron Emission for DLC Film Preparation

The effects of a hollow cathode discharge and secondary electron emission from a radio‐frequency‐biased electrode on the growing rate of diamond‐like carbon films were studied. The rate of deposition for amorphous hydrogenous carbon thin films of about 200 nm·min −1 was attained at a voltage of −700 V with radio‐frequency plasma using CH 4 gas. Because of its non‐uniformity, the profile was improved by changing the hole arrangement. A radial roughness of the deposited films of about 35 nm, for a film thickness of about 1 µm, was obtained with the best arrangement.