Deep level defect in Si-implanted GaN n+-p junction

A deep level transient spectroscopy (DLTS) study has been performed on a GaN n+-p junction fabricated by implanting Si into a Mg-doped p-type GaN epilayer. A high concentration of a deep level defect has been revealed within the interfacial region of the junctions by the unusual appearance of a minority peak in the majority carrier DLTS spectra. The deep level defect appears to be an electron trap at EC-0.59 eV in the p-side region of the junction and has tentatively been attributed to the VN–Mg complex. The high concentration of this electrically active deep level defect in the depletion layer of the Si-implanted GaN n+-p junction diodes suggests the need for further investigations.