A study of novolac polymer etching in an oxygen microwave multipolar plasma with independent rf wafer biasing is reported. A step-like etch rate variation with temperature is observed for these polymers. Experiments conducted on chemically identical novolacs with different molecular weights allow this phenomenon to be correlated with their glass transition temperatures. Etch rate variations are caused by the thermal effect of ion bombardment, emphasizing the role of viscoelastic properties in polymer plasma etching.
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Joubert et al. (1991) studied this question.
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